IIAE CONFERENCE SYSTEM, The 5th IIAE International Conference on Industrial Application Engineering 2017 (ICIAE2017)

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Electrolytic Treatment Characteristics of Boron-doped Nanocrystalline Diamond/Amorphous Carbon Composite Films Prepared by Coaxial Arc Plasma Deposition
Takumi Takenaga, Masaya Onishi, Daisuke Fujimoto, Yoshihiro Nojiri, Takeshi Hara

Last modified: 2017-02-21


Boron-doped nanocrystalline diamond amorphous carbon composite (NCD/a-C) films were fabricated by coaxial arc plasma deposition (CAPD). Electrical conductivity measurements and thermal analysis confirmed that the deposited films exhibited p-type semiconductor behavior. Cyclic voltammetry measurements of deposited films showed a wide electrical potential window and an extremely low background current. 4-Nitrophenol (4-NP) aqueous solution, which is a recalcitrant substance, was decomposed via electrolytic treatment using a batch-type electrolytic treatment system wherein the B-doped NCD/a-C films were used as anodes. UV-vis spectra showed that the absorbance of 4-NP at 400 nm decreased with increasing electrolytic treatment time. This behavior implies that the B-doped NCD/a-C films deposited by CAPD are potential electrode materials for use in the electrolytic degradation of recalcitrant substances.


nanocrystalline diamond, coaxial arc plasma deposition, electrolytic treatment

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